Controlling the composition of Ti1–xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition

Publisher
A V S Amer Inst Physics
Issue Date
2003-08
Language
ENG
Keywords

CHEMICAL-VAPOR-DEPOSITION; SPUTTERED TIALN FILMS; MECHANICAL-PROPERTIES; TITANIUM NITRIDE; COATINGS; SURFACE; GROWTH

Citation

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.21, no.5, pp.L13 - L15

ISSN
0734-2101
URI
http://hdl.handle.net/10203/3256
Appears in Collection
MS-Journal Papers(저널논문)
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