Dependence of oxygen redistribution on titanium film thickness during titanium silicide formation by rapid thermal annealing

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dc.contributor.authorKang, S.W.ko
dc.contributor.authorPark, Sin Chongko
dc.contributor.authorChun , Soung Soonko
dc.date.accessioned2008-03-05T05:57:58Z-
dc.date.available2008-03-05T05:57:58Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued1989-11-
dc.identifier.citationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v.7, no.6, pp.3246 - 3250-
dc.identifier.issn0734-2101-
dc.identifier.urihttp://hdl.handle.net/10203/3255-
dc.description.sponsorshipThe authors wish to thank J.H.Lee, S.J.Park, and S.J.Yoo for useful discussion, J.T.Baek, W.G.kang, and S.I.Huh for assistance with experimentsen
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherA V S Amer Inst Physics-
dc.titleDependence of oxygen redistribution on titanium film thickness during titanium silicide formation by rapid thermal annealing-
dc.typeArticle-
dc.identifier.wosidA1989AZ99000015-
dc.identifier.scopusid2-s2.0-84956040386-
dc.type.rimsART-
dc.citation.volume7-
dc.citation.issue6-
dc.citation.beginningpage3246-
dc.citation.endingpage3250-
dc.citation.publicationnameJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorKang, S.W.-
dc.contributor.localauthorPark, Sin Chong-
dc.contributor.localauthorChun , Soung Soon-
dc.type.journalArticleArticle-
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