Contour offset algorithm for precise patterning in two-photon polymerization

A contour offset algorithm (COA) has been developed to fabricate precise patterns easily in the range of several microns using a nano-replication printing (nRP) process, which employs two-photon polymerization. In this process, microscale patterns are fabricated by a voxel matrix scanning method that uses raster graphic data transformed from the two-tone (black and white) bitmap figure file. The raster data consist of two kinds of entities to control laser on/off, '1' for laser-on and '0' for laser-off. However, the replicated patterns did not precisely coincide with an initial design due to an intrinsic shortage of the nRP process: the fabricated patterns become generally larger than the designed shape. To solve the point at issue, the COA was proposed in this work: an outer-contour matrix of an initial design was reconstructed then, it was modified by the amounts of offset-ratio that can be calculated using the relation of a pattern size, a designed figure size, and a voxel size. The effectiveness of the proposed algorithm was evaluated through several examples with 200 nm resolution. (c) 2005 Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
2005-04
Language
ENG
Keywords

3-DIMENSIONAL MICROFABRICATION; LASER NANOFABRICATION; FEMTOSECOND LASER; PHOTOPOLYMERIZATION; MICROMACHINES; ABSORPTION

Citation

MICROELECTRONIC ENGINEERING, v.77, no.3-4, pp.382 - 388

ISSN
0167-9317
DOI
10.1016/j.mee.2005.01.022
URI
http://hdl.handle.net/10203/3017
Appears in Collection
ME-Journal Papers(저널논문)
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