Modeling and simulation for wafer temperature uniformity in RTP systemRTP 시스템내의 웨이퍼 온도 균일도를 위한 모델링 및 모사

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Rapid thermal processing (RTP) emerged as an attractive technology to replace conventional batch processes in the microelectronics industry for thermal processing of devices with submicron dimensional constraints. RTP is suitable for multi-chamber system and can minimize the overall thermal budget of the process by reducing the processing time instead of reducing the temperature. As the wafer size increases, the temperature nonuniformity across the wafer surface becomes serious. This study considers the problem of controlling a 12 inch RTP system with 5 independently-controllable lamp zones. We present a systematic approach to the modeling of the RTP system. In this study numerical techniques are developed for using a thermal model to find the heat transfer characteristics of the RTP system and optimize performance of temperature control configurations. For minimizing temperature error across the wafer during steady state hold, we used the optimization method presented by Norman, which is to solve the minimax problem with linear programming. Optimal lamp settings for each temperature setpoint were obtained by this method and the simulation results using these lamp settings showed about 1.5℃ degree of Celsius worst nonuniformity. And applying the optimization method for steady state temperature uniformity, we could obtain the lamp power trajectories to minimize worst-case temperature error over both time and radial position on the wafer during desired temperature trajectories. These optimization results show that very good temperature uniformity can be achieved for 12 inch RTP system during both steady state and transient state. These optimization techniques are potentially valuable not only in control system for given RTP systems but also in design of new RTP systems. Open-loop optimization of lamp zone settings can be used to design feedforward lamp power signals for use in open-loop-plus-feedback systems.
Advisors
Park, Sun-Wonresearcher박선원researcher
Description
한국과학기술원 : 화학공학과,
Publisher
한국과학기술원
Issue Date
1998
Identifier
133654/325007 / 000963278
Language
eng
Description

학위논문(석사) - 한국과학기술원 : 화학공학과, 1998.2, [ ix, 86 p. ]

Keywords

Naphtha cracking center; Control; Distillation column; Dynamic simulation; Optimization; 최적화; 납사분해공장; 제어; 증류탑; 동적모사

URI
http://hdl.handle.net/10203/29604
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=133654&flag=dissertation
Appears in Collection
CBE-Theses_Master(석사논문)
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