DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, BS | ko |
dc.contributor.author | Lee, JH | ko |
dc.contributor.author | Yoon, HS | ko |
dc.contributor.author | Yang, JW | ko |
dc.contributor.author | Park, Chul Soon | ko |
dc.contributor.author | Pyun, KE | ko |
dc.date.accessioned | 2020-01-09T03:20:07Z | - |
dc.date.available | 2020-01-09T03:20:07Z | - |
dc.date.created | 2020-01-06 | - |
dc.date.issued | 1996-11 | - |
dc.identifier.citation | ELECTRONICS LETTERS, v.32, no.24, pp.2270 - 2271 | - |
dc.identifier.issn | 0013-5194 | - |
dc.identifier.uri | http://hdl.handle.net/10203/271003 | - |
dc.description.abstract | The authors propose a new optical lithographic technique to form a 0.15 mu m length T-shaped gate. The lithographic technique is composed of PSM, low temperature PECVD of SiN, concurrent development and planarisation of the photoresist. By using this technique, a 0.15 mu m AlGaAs/InGaAs/GaAs PHEMT was successfully fabricated, and with a transconductance of 498mS/mm and cutoff frequency of 62.4GHz. | - |
dc.language | English | - |
dc.publisher | IEE-INST ELEC ENG | - |
dc.title | 0.15 mu m T-shaped gate pseudomorphic HEMT fabricated using a new optical lithographic technique | - |
dc.type | Article | - |
dc.identifier.wosid | A1996WL18700058 | - |
dc.identifier.scopusid | 2-s2.0-0030287315 | - |
dc.type.rims | ART | - |
dc.citation.volume | 32 | - |
dc.citation.issue | 24 | - |
dc.citation.beginningpage | 2270 | - |
dc.citation.endingpage | 2271 | - |
dc.citation.publicationname | ELECTRONICS LETTERS | - |
dc.identifier.doi | 10.1049/el:19961492 | - |
dc.contributor.localauthor | Park, Chul Soon | - |
dc.contributor.nonIdAuthor | Park, BS | - |
dc.contributor.nonIdAuthor | Lee, JH | - |
dc.contributor.nonIdAuthor | Yoon, HS | - |
dc.contributor.nonIdAuthor | Yang, JW | - |
dc.contributor.nonIdAuthor | Pyun, KE | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | lithography | - |
dc.subject.keywordAuthor | high electron mobility transistors | - |
dc.subject.keywordAuthor | phase shifting masks | - |
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