DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | Yoo, Seunghyup | - |
dc.contributor.advisor | 유승협 | - |
dc.contributor.author | Jeong, Hyeonho | - |
dc.date.accessioned | 2019-08-25T02:45:47Z | - |
dc.date.available | 2019-08-25T02:45:47Z | - |
dc.date.issued | 2017 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=868076&flag=dissertation | en_US |
dc.identifier.uri | http://hdl.handle.net/10203/265229 | - |
dc.description | 학위논문(박사) - 한국과학기술원 : 전기및전자공학부, 2017.8,[x, 112 p. :] | - |
dc.description.abstract | Nano-scale patterning is a key enabler of nanotechnology and has played a pivotal role in enhancing performance capabilities and in the realization of new functionalities in a wide range of applications, including electronics,optics, energetics, and even biology. While cutting-edge lithographic processes based on deep UV or electron beam methods have successfully led the evolution of modern nano-patterning technologies, their use has been limited to a few high-end applications due to the very high costs associated with the equipment and the multi-step processes required. In this respect, alternative nano-patterning methods have been proposed, such as simplified lithography techniques, nano-transfer methods, and the capillary assembly method. However, significant advances are still required to realize a cost-effective and scalable nano-patterning process with a high degree of freedom, a wide range of applicability, and a practicable throughput. Here, we propose a direct, additive, and solution-based nano-patterning route by employing selective wetting on engraved hydrophilic nano-patterns with a hydrophobic top surface prepared by a one-step imprinting process. The proposed process produces uniform single- or multilayer nano-patterns over large area at high speeds and exhibits good compatibility with a wide range of substrates,including plastics, paper, or even banknotes. Experimental results are supported by an analysis based on a fluid-dynamic simulation which sheds light on the operation mechanism and key controlling parameters of the proposed process. | - |
dc.language | eng | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | nano-scale patterning▼asolution material patterning▼anano-imprinting▼aselective wetting | - |
dc.subject | 나노스케일 패터닝▼a용액 공정▼a나노-임프린팅▼a선택적 젖음성 | - |
dc.title | Nano-scale patterning process using selective wetting and its applications | - |
dc.title.alternative | 선택적 젖음성을 이용한 나노스케일 패터닝 공정과 그 응용 | - |
dc.type | Thesis(Ph.D) | - |
dc.identifier.CNRN | 325007 | - |
dc.description.department | 한국과학기술원 :전기및전자공학부, | - |
dc.contributor.alternativeauthor | 정현호 | - |
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