Nano-patterning process of self-assembled monolayer via si-containing block copolymer lithography on gold substrate
- Publisher
- 대한 화학회
- Issue Date
- 2011-04-28
- Language
- Korean
- Citation
2011 춘계 대한화학회
- Appears in Collection
- CH-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.