Stability of boron dopants at the interface between Si and amorphous SiO2

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dc.contributor.author오영준ko
dc.contributor.author노현균ko
dc.contributor.author장기주ko
dc.date.accessioned2019-04-16T02:51:20Z-
dc.date.available2019-04-16T02:51:20Z-
dc.date.created2014-01-12-
dc.date.issued2011-06-
dc.identifier.citationThe 7th KIAS Electronic Structure Calculation Workshop-
dc.identifier.urihttp://hdl.handle.net/10203/260051-
dc.languageKorean-
dc.publisherKIAS-
dc.titleStability of boron dopants at the interface between Si and amorphous SiO2-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameThe 7th KIAS Electronic Structure Calculation Workshop-
dc.identifier.conferencecountryKO-
dc.contributor.localauthor장기주-
dc.contributor.nonIdAuthor오영준-
dc.contributor.nonIdAuthor노현균-
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PH-Conference Papers(학술회의논문)
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