Calibration method for rotating-analyser-type spectral imaging ellipsometers

Data reduction and calibration procedures are introduced for a,novel rotating-analyser-type spectral imaging ellipsometer. Using a monaxial power spectrograph, we developed a unique spectral imaging ellipsometer. It combines one-dimensional imaging ellipsometry with spectroscopic ellipsometry, and enables real-time measurement of the optical parameters and dimensional structures of patterned or multilayered thin film. It also has more calibration factors than conventional ellipsometers. We therefore present a method using Jones matrices for describing the polarization sensitivity of the spectrograph and random noise of the CCD array. For a patterned SiO2 layer on a silicon wafer, we used the spectral imaging ellipsometer to obtain a one-dimensional thickness profile.
Publisher
IOP PUBLISHING LTD
Issue Date
2005-03
Language
ENG
Keywords

SILICON; MICROELLIPSOMETRY; SURFACES; DESIGN; SYSTEM

Citation

MEASUREMENT SCIENCE & TECHNOLOGY, v.16, pp.716 - 722

ISSN
0957-0233
DOI
10.1088/0957-0233/16/3/014
URI
http://hdl.handle.net/10203/2575
Appears in Collection
ME-Journal Papers(저널논문)
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