This paper presents a CMOS image sensor with the in-pixel aperture technique for single-chip 2-D and 3-D imaging. In conventional image sensors, the aperture is located at the camera lens. However, in the proposed image sensor, the aperture is integrated on the CMOS image sensor chip and is formed at a metal layer of the CMOS image sensor (CIS) process. A pixel array of the image sensor is composed of the W, R, B, and PA pixels (W pixel with integrated metal aperture) for extracting color and depth information. While the image of the W pixel becomes blurred with increasing distance from a focused object, the image of the PA pixel maintains the sharpness. Therefore, the depth image can be obtained using the depth from the defocus method. The size of the pixel, which is based on a four-transistor active pixel sensor with pinned photodiode, is 2.8 mu m x 2.8 mu m. A prototype of the proposed image sensor was fabricated using the 0.11-mu m CIS process and its performance was evaluated.