DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jeon, Seokwoo | ko |
dc.contributor.author | Park, JU | ko |
dc.contributor.author | Cirelli, R | ko |
dc.contributor.author | Yang, S | ko |
dc.contributor.author | Heitzman, CE | ko |
dc.contributor.author | Braun, PV | ko |
dc.contributor.author | Kenis, PJA | ko |
dc.contributor.author | Rogers, JA | ko |
dc.date.accessioned | 2011-07-13T07:41:08Z | - |
dc.date.available | 2011-07-13T07:41:08Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004-08 | - |
dc.identifier.citation | PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, v.101, no.34, pp.12428 - 12433 | - |
dc.identifier.issn | 0027-8424 | - |
dc.identifier.uri | http://hdl.handle.net/10203/24612 | - |
dc.description.abstract | High-resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of 3D nanostructures that are technologically important but difficult to generate in other ways. In this approach, light passing through a phase mask that has features of relief comparable in dimension to the wavelength generates a 3D distribution of intensity that exposes a photopolymer film throughout its thickness. Developing this polymer yields a structure in the geometry of the intensity distribution, with feature sizes as small as 50 nm. Rigorous coupled-wave analysis reveals the fundamental aspects of the optics associated with this method; a broad-range 3D nanostructures patterned with it demonstrates its technical capabilities. A nanoporous filter element built inside a microfluidic channel represents one example of the many types of functional devices that can be constructed. | - |
dc.description.sponsorship | This article is based on work supported by the U.S. Department of Energy, Division of Materials, through the Frederick Seitz Materials Research Laboratory and the Center for Microanalysis of Materials at the University of Illinois at Urbana–Champaign. | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | NATL ACAD SCIENCES | - |
dc.subject | HOLOGRAPHIC LITHOGRAPHY | - |
dc.subject | PHOTONIC CRYSTALS | - |
dc.subject | BLOCK-COPOLYMERS | - |
dc.subject | MICROFABRICATION | - |
dc.subject | LIGHT | - |
dc.subject | NANOFABRICATION | - |
dc.subject | MICROMACHINES | - |
dc.subject | INTERFERENCE | - |
dc.subject | MEMBRANES | - |
dc.subject | BEHAVIOR | - |
dc.title | Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks | - |
dc.type | Article | - |
dc.identifier.wosid | 000223596200008 | - |
dc.identifier.scopusid | 2-s2.0-4344674672 | - |
dc.type.rims | ART | - |
dc.citation.volume | 101 | - |
dc.citation.issue | 34 | - |
dc.citation.beginningpage | 12428 | - |
dc.citation.endingpage | 12433 | - |
dc.citation.publicationname | PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA | - |
dc.identifier.doi | 10.1073/pnas.0403048101 | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Jeon, Seokwoo | - |
dc.contributor.nonIdAuthor | Park, JU | - |
dc.contributor.nonIdAuthor | Cirelli, R | - |
dc.contributor.nonIdAuthor | Yang, S | - |
dc.contributor.nonIdAuthor | Heitzman, CE | - |
dc.contributor.nonIdAuthor | Braun, PV | - |
dc.contributor.nonIdAuthor | Kenis, PJA | - |
dc.contributor.nonIdAuthor | Rogers, JA | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | HOLOGRAPHIC LITHOGRAPHY | - |
dc.subject.keywordPlus | PHOTONIC CRYSTALS | - |
dc.subject.keywordPlus | BLOCK-COPOLYMERS | - |
dc.subject.keywordPlus | MICROFABRICATION | - |
dc.subject.keywordPlus | LIGHT | - |
dc.subject.keywordPlus | NANOFABRICATION | - |
dc.subject.keywordPlus | MICROMACHINES | - |
dc.subject.keywordPlus | INTERFERENCE | - |
dc.subject.keywordPlus | MEMBRANES | - |
dc.subject.keywordPlus | BEHAVIOR | - |
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