Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks

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High-resolution, conformable phase masks provide a means to fabricate, in an experimentally simple manner, classes of 3D nanostructures that are technologically important but difficult to generate in other ways. In this approach, light passing through a phase mask that has features of relief comparable in dimension to the wavelength generates a 3D distribution of intensity that exposes a photopolymer film throughout its thickness. Developing this polymer yields a structure in the geometry of the intensity distribution, with feature sizes as small as 50 nm. Rigorous coupled-wave analysis reveals the fundamental aspects of the optics associated with this method; a broad-range 3D nanostructures patterned with it demonstrates its technical capabilities. A nanoporous filter element built inside a microfluidic channel represents one example of the many types of functional devices that can be constructed.
Publisher
NATL ACAD SCIENCES
Issue Date
2004-08
Language
English
Article Type
Article
Keywords

HOLOGRAPHIC LITHOGRAPHY; PHOTONIC CRYSTALS; BLOCK-COPOLYMERS; MICROFABRICATION; LIGHT; NANOFABRICATION; MICROMACHINES; INTERFERENCE; MEMBRANES; BEHAVIOR

Citation

PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, v.101, no.34, pp.12428 - 12433

ISSN
0027-8424
DOI
10.1073/pnas.0403048101
URI
http://hdl.handle.net/10203/24612
Appears in Collection
MS-Journal Papers(저널논문)
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