Enhanced self-assembly of block copolymers by surface modification of a guiding template

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The formation of highly ordered patterns of block copolymers (BCPs) with high. is important for next-generation lithography applications. We demonstrate here a surface-engineering methodology to enhance the self-assembly of poly (styrene-b-dimethylsiloxane) (PS-b-PDMS) BCPs with high. by employing a hydroxyl-terminated polystyrene (PS-OH) brush. By precisely controlling the molecular weight (MW) and weight percent of PS-OH, well-ordered sub-20-nm BCP patterns were obtained over a large area in a short annealing time (< 10 min) with the use of guiding templates. We systemically analyzed how the PS-OH brush affects the self-assembly kinetics of BCPs with various MWs and volume fractions. Moreover, the transmission electron microscopy (TEM) results strongly support that the PS-modulated surface plays an important role in the ordering of BCP patterns. We also achieved well-aligned 12 nm line and 18 nm dot patterns within 3 min by means of binary solvent vapor annealing at a moderate temperature under the optimum PS-OH brush conditions. These results provide a new platform for effective engineering and manipulation of the self-assembly of other BCPs for advanced BCP nanotechnologies.
Publisher
NATURE PUBLISHING GROUP
Issue Date
2018-02
Language
English
Article Type
Article
Keywords

PATTERNS; NANOSTRUCTURES; LITHOGRAPHY; ORIENTATION; BRUSHES; ARRAYS; GRAPHOEPITAXY; MICRODOMAINS; TEMPERATURE; ORDER

Citation

POLYMER JOURNAL, v.50, no.2, pp.221 - 229

ISSN
0032-3896
DOI
10.1038/s41428-017-0007-5
URI
http://hdl.handle.net/10203/241542
Appears in Collection
MS-Journal Papers(저널논문)
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