CMOS Image SensorCMOS 이미지 센서

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Disclosed is a CMOS image sensor, comprising a photodiode formed in a substrate, a floating diffusion region formed in the substrate in a manner such that it is distanced from the photodiode surrounds the photodiode and a transfer gate formed in a manner such that it is distanced from the photodiode and the floating diffusion region and formed in a boundary area between the photodiode and the floating diffusion region, thereby overlapping the photodiode and the floating diffusion region.
Assignee
KAIST
Country
JA (Japan)
Issue Date
2009-09-18
Application Date
2006-06-16
Application Number
2006-166845
Registration Date
2009-09-18
Registration Number
4378363
URI
http://hdl.handle.net/10203/229352
Appears in Collection
EE-Patent(특허)
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