Ultrathin adhesive film development via initiated chemical vapor deposition = 개시제를 이용한 화학적 기상증착공정을 통한 접착용 초박막 개발

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Along with the scaling down of various applications such as microfluidics and electronic devices, adhesive film also need to be scale down, with high controllability and stability. Various method is reported to achieve strong adhesion, still has problems about process time, systematic limitation, and thickness control. In this study, thin adhesive layer is developed via initiated chemical vapor deposition (iCVD). Poly(glycidyl methacrylate) (pGMA) and poly(2-(dimethylamino)ethyl methacrylate) (pDMAEMA) are deposited on the substrate, and ring opening reaction which is very well known as a strong adhesion, is achieved in hundred nanometer scales. Every polymer film is deposited with one system, iCVD, in mild condition. With this adhesive system, strong adhesion strength near to $300 N/cm^{2}$ has been achieved, with high resistive to organic solvents and high temperature. With the new material selection, process time is dramatically shortened compared to previous works. Proper optical properties are confirmed for the compatibility for optical devices. For the application, lamination of encapsulation layer using iCVD adhesive film is performed, and achieved $2.94x10^{-2} g m^{-2} day^{-1}$ value of water vapor transmission rate
Advisors
Im, Sung Gapresearcher임성갑researcher
Description
한국과학기술원 :생명화학공학과,
Publisher
한국과학기술원
Issue Date
2016
Identifier
325007
Language
eng
Description

학위논문(석사) - 한국과학기술원 : 생명화학공학과, 2016.2 ,[iv, 36 p. :]

Keywords

initiated chemical vapor deposition; iCVD; amine epoxy reaction; adhesive; lamination; encapsulation; 아민에폭시반응; 접착; 접착식 봉지막; 봉지막

URI
http://hdl.handle.net/10203/221518
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=649471&flag=dissertation
Appears in Collection
CBE-Theses_Master(석사논문)
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