Machine learning-based 3D resist model
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Shim, Seongbo | ko |
| dc.contributor.author | Choi, Suhyeong | ko |
| dc.contributor.author | Shin, Youngsoo | ko |
| dc.date.accessioned | 2016-12-14T00:55:31Z | - |
| dc.date.available | 2016-12-14T00:55:31Z | - |
| dc.date.created | 2016-11-21 | - |
| dc.date.created | 2016-11-21 | - |
| dc.date.issued | 2017-02-26 | - |
| dc.identifier.citation | SPIE Advanced Lithography | - |
| dc.identifier.uri | http://hdl.handle.net/10203/214686 | - |
| dc.language | English | - |
| dc.publisher | SPIE | - |
| dc.title | Machine learning-based 3D resist model | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | SPIE Advanced Lithography | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | San Jose, California | - |
| dc.contributor.localauthor | Shin, Youngsoo | - |
| dc.contributor.nonIdAuthor | Choi, Suhyeong | - |
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