Cut mask optimization for multi-patterning directed self-assembly lithography

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dc.contributor.authorPonghiran, Wachirawit-
dc.contributor.authorShim, Seongbo-
dc.contributor.authorShin, Youngsoo-
dc.date.accessioned2016-12-14T00:53:53Z-
dc.date.available2016-12-14T00:53:53Z-
dc.date.created2016-11-21-
dc.date.issued2017-03-27-
dc.identifier.citationDesign, Automation & Test in Europe (DATE), v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/214682-
dc.languageENG-
dc.publisherIEEE-
dc.titleCut mask optimization for multi-patterning directed self-assembly lithography-
dc.typeConference-
dc.identifier.pid20135166-
dc.identifier.pid1255-
dc.identifier.rimsid92502-
dc.type.rimsCONF-
dc.citation.publicationnameDesign, Automation & Test in Europe (DATE)-
dc.identifier.conferencecountrySwitzerland-
dc.contributor.localauthorShim, Seongbo-
dc.contributor.localauthorShin, Youngsoo-
dc.contributor.nonIdAuthorPonghiran, Wachirawit-
dc.contributor.localid20135166-
dc.contributor.localid1255-
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EE-Conference Papers(학술회의논문)
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