Cut mask optimization for multi-patterning directed self-assembly lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ponghiran, Wachirawit | ko |
| dc.contributor.author | Shim, Seongbo | ko |
| dc.contributor.author | Shin, Youngsoo | ko |
| dc.date.accessioned | 2016-12-14T00:53:53Z | - |
| dc.date.available | 2016-12-14T00:53:53Z | - |
| dc.date.created | 2016-11-21 | - |
| dc.date.created | 2016-11-21 | - |
| dc.date.created | 2016-11-21 | - |
| dc.date.issued | 2017-03-27 | - |
| dc.identifier.citation | Design, Automation & Test in Europe (DATE) | - |
| dc.identifier.uri | http://hdl.handle.net/10203/214682 | - |
| dc.language | English | - |
| dc.publisher | European Design and Automation Association (EDAA) | - |
| dc.title | Cut mask optimization for multi-patterning directed self-assembly lithography | - |
| dc.type | Conference | - |
| dc.identifier.wosid | 000404171500280 | - |
| dc.identifier.scopusid | 2-s2.0-85020192459 | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | Design, Automation & Test in Europe (DATE) | - |
| dc.identifier.conferencecountry | SZ | - |
| dc.identifier.conferencelocation | Lausanne | - |
| dc.contributor.localauthor | Shin, Youngsoo | - |
| dc.contributor.nonIdAuthor | Ponghiran, Wachirawit | - |
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