Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly

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High-resolution (10 nm), high-areal density, high-aspect ratio (>5), and morphologically complex nanopatterns are fabricated from a single conventional block copolymer (BCP) structure with a 70 nm scale resolution and an aspect ratio of 1, through the secondary-sputtering phenomenon during the Ar-ion-bombardment process. This approach provides a foundation for the design of new routes to BCP lithography
Publisher
WILEY-V C H VERLAG GMBH
Issue Date
2016-10
Language
English
Article Type
Article
Keywords

QUANTUM DOTS; LARGE-AREA; LITHOGRAPHY; ARRAYS; TEMPLATES; PATTERNS; GRAPHENE; GOLD

Citation

ADVANCED MATERIALS, v.28, no.38, pp.8439 - 8445

ISSN
0935-9648
DOI
10.1002/adma.201602523
URI
http://hdl.handle.net/10203/214445
Appears in Collection
MS-Journal Papers(저널논문)CBE-Journal Papers(저널논문)
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