A STAINING TECHNIQUE FOR THE STUDY OF TWO-DIMENSIONAL DOPANT DIFFUSION IN SILICON

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Publisher
ELECTROCHEMICAL SOC INC
Issue Date
1988-09
Language
English
Article Type
Note
Citation

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.135, no.9, pp.2370 - 2373

ISSN
0013-4651
DOI
10.1149/1.2096273
URI
http://hdl.handle.net/10203/214187
Appears in Collection
RIMS Journal Papers
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