Nb doping effect on TiO2-x films for bolometer applications

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Nb-doped TiO2-x thin films were deposited using a 1 at% niobium doped titanium target by RF reactive magnetron sputtering at various oxygen partial pressures (pO(2)). The films appeared amorphous in the pO(2) range of 4.4-4.7% with resistivity ranging from 039 Omega cm to 2.48 Omega cm. Compared to pure TiO2-x films, the resistivity of the Nb-doped TiO2-x films did not change sensitively with the oxygen partial pressure, indicating that the resistivity of the films can be accurately controlled. 1/f noise parameter of Nb-doped TiO2-x films were found to decrease largely while the measured temperature coefficient of resistance (TCR) of the films was still high. The obtained results indicate that Nb-doped TiO2-x films have great potential as an alternative bolometric material. (C) 2016 Elsevier Ltd. All rights reserved
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Issue Date
2016-04
Language
English
Article Type
Article
Keywords

TITANIUM-OXIDE FILMS; THIN-FILMS; HYDROPHILICITY; GLASS

Citation

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, v.91, pp.128 - 135

ISSN
0022-3697
DOI
10.1016/j.jpcs.2016.01.002
URI
http://hdl.handle.net/10203/208742
Appears in Collection
EE-Journal Papers(저널논문)
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