Selective sub-10 nm etching of SiO2 layer by carbothermal reduction using single walled carbon nanotubes
- Publisher
- AMER CHEMICAL SOC
- Issue Date
- 2007-03
- Language
- English
- Article Type
- Meeting Abstract
- Citation
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, v.233, pp.478 - 478
- ISSN
- 0065-7727
- Appears in Collection
- CH-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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