원자층 증착 방법을 이용한 낮은 일함수를 갖는 탄화에르븀 박막 증착 및 에르븀저마나이드 형성에 대한 연구Atomic layer deposition of erbium carbide film for n-type workfunction metal and erbium germanide
- Advisors
- 조병진researcher; Cho, Byung Jinresearcher
- Description
- 한국과학기술원 :전기및전자공학과
- Publisher
- 한국과학기술원
- Issue Date
- 2015
- Identifier
- 325007
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 전기및전자공학과, 2015.2 ,[vii, 63. :]
- Keywords
원자층 증착 방법; 일함수; 에르븀; 탄화에르븀; 에르븀저마나이드; Metal ALD; Tris(isopropylcyclopentadienyl)erbium; Workfunction; Erbium; Erbium carbide; Erbium di-carbide; Erbium germanide
- Appears in Collection
- EE-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.