Universal block copolymer lithography for metals, semiconductors, ceramics, and polymers
A universal block copolymer lithography is developed for a broad spectrum of materials including metals, semiconductors, ceramics, and polymers by combining advanced film deposition techniques with block copolymer lithography. The figure presents a nanopatterned platinum film prepared by applying universal block copolymer lithography.
- Publisher
- WILEY-V C H VERLAG GMBH
- Issue Date
- 2008-05
- Language
- English
- Article Type
- Article
- Keywords
NANOWIRE ARRAYS; FABRICATION; SURFACES; NANOSTRUCTURES; NANOCRYSTALS; CHEMISTRY; ISLANDS; ROUTES; LAYERS; FILMS
- Citation
ADVANCED MATERIALS, v.20, no.10, pp.1898 - 1898
- ISSN
- 0935-9648
- Appears in Collection
- MS-Journal Papers(저널논문)
- Files in This Item
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