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Results 51-60 of 60 (Search time: 0.011 seconds).
| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Characterization of oxide Charging in a Magnetically Enhanced Rie Polysilicon Etcher Hyung-Cheol Shin, Proc. 11th International Syposium on Plasma Chemistry, pp.1534 - 1539, 1993 | |
| Gate Oxide Damage by Plasma Oxide Deposition and Via RIE Hyung-Cheol Shin, American Vacuum Society Plasma Etch 1992 Symposium, 1992 | |
| Impact of Plasma Charging Damage and Diode Protection on Scaled Thin Oxide Hyung-Cheol Shin, IEDM Technical Digest, pp.467 - 470, 1993 | |
| Plasma-Etching induced Damage to Thin Oxide Hyung-Cheol Shin, IEEE/SEMI Advanced Semiconductor Manufacturing Conference, pp.79 - 83, 1992 | |
| A Model of Thin Oxide Damage by Plasma Etching and Ashing Processes Hyung-Cheol Shin, Plasma Etch, pp.27 - 29, 1991 | |
| RF characteristics of 30 nm MOSFETs with non-overlapped source-drain to gate Hyung-Cheol Shin, Silicon Nanoelectronics Workshop 2002, 2002 | |
| On the large-signal CMOS modeling and parameter extraction for RF applications Hyung-Cheol Shin, SISPAD 2002, pp.67 - 70, SISPAD, 2002-09 | |
| The P-Channel Si Nano-Crystal Memory Hyung-Cheol Shin, ICSICT 2001, pp.200 - 204, ICSICT, 2001-10 | |
| A new quantum dot formation process using wet etching of poly-Si along grain boundaries Hyung-Cheol Shin, MNC2000, pp.248 - 249, MNC, 2000-07 | |
| Effects of S/D non-overlap and high-κ dielectrics on nano CMOS design Hyung-Cheol Shin, ISDRS, pp.661 - 664, ISDRS, 2001-12 |
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Date issued
- 26 2000 - 2003
- 34 1991 - 1999