10 nm scale nanopatterning on flexible substrates by a secondary sputtering phenomenon and their applications in high performance, flexible and transparent conducting films

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We present a simple nanopatterning method for flexible substrates with high resolution (approx. 15 nm) that uses the secondary sputtering phenomenon (SSP) and no solvents at room temperature, and characterize flexible and transparent conducting films that have performances comparable to that of ITO films yet higher mechanical stability.
Publisher
ROYAL SOC CHEMISTRY
Issue Date
2014-05
Language
English
Article Type
Article
Keywords

METAL-ELECTRODES; TRANSISTORS; ARRAYS; SENSORS

Citation

JOURNAL OF MATERIALS CHEMISTRY C, v.2, no.18, pp.3527 - 3531

ISSN
2050-7526
DOI
10.1039/c4tc00012a
URI
http://hdl.handle.net/10203/192713
Appears in Collection
CBE-Journal Papers(저널논문)
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