High Throughput Ultralong (20 cm) Nanowire Fabrication Using a Wafer-Scale Nanograting Template

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dc.contributor.authorYeon, Jeonghoko
dc.contributor.authorLee, Young Jaeko
dc.contributor.authorYoo, Dong Eunko
dc.contributor.authorYoo, Kyoung Jongko
dc.contributor.authorKim, Jin Suko
dc.contributor.authorLee, Junko
dc.contributor.authorLee, Jeong Oenko
dc.contributor.authorChoi, Seon-Jinko
dc.contributor.authorYoon, Gun-Wookko
dc.contributor.authorLee, Dong Wookko
dc.contributor.authorLee, Gi Seongko
dc.contributor.authorHwang, Hae Chulko
dc.contributor.authorYoon, Jun-Boko
dc.date.accessioned2014-08-26T08:31:21Z-
dc.date.available2014-08-26T08:31:21Z-
dc.date.created2013-10-05-
dc.date.created2013-10-05-
dc.date.issued2013-09-
dc.identifier.citationNANO LETTERS, v.13, no.9, pp.3978 - 3984-
dc.identifier.issn1530-6984-
dc.identifier.urihttp://hdl.handle.net/10203/187147-
dc.description.abstractNanowires are being actively explored as promising nanostructured materials for high performance flexible electronics, biochemical sensors, photonic applications, solar cells, and secondary batteries. In particular, ultralong (centimeter-long) nanowires are highly attractive from the perspective of electronic performance, device throughput (or productivity), and the possibility of novel applications. However, most previous works on ultralong nanowires have issues related to limited length, productivity, difficult alignment, and deploying onto the planar substrate complying with well-matured device fabrication technologies. Here, we demonstrate a highly ordered ultralong (up to 20 cm) nanowire array, with a diameter of 50 nm (aspect ratio of up to 4 000 000:1), in an unprecedented large (8 in.) scale (2 000 000 strands on a wafer). We first devised a perfectly connected ultralong nanograting master template on the whole area of an 8 in. substrate using a top-down approach, with a density equivalent to that achieved with e-beam lithography (100 nm). Using this large-area, ultralong, high-density nanograting template, we developed a fast and effective method for fabricating up to 20 cm long nanowire arrays on a plastic substrate, composed of metal, dielectric, oxide, and ferroelectric materials. As a suggestion of practical application, a prototype of a large-area aluminum wire grid polarizer was demonstrated.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.subjectWIRE GRID POLARIZER-
dc.subjectLARGE-AREA-
dc.subjectARRAYS-
dc.subjectLITHOGRAPHY-
dc.subjectSENSORS-
dc.subjectNANOTUBES-
dc.subjectDEVICES-
dc.subjectGROWTH-
dc.titleHigh Throughput Ultralong (20 cm) Nanowire Fabrication Using a Wafer-Scale Nanograting Template-
dc.typeArticle-
dc.identifier.wosid000330158900003-
dc.identifier.scopusid2-s2.0-84884267687-
dc.type.rimsART-
dc.citation.volume13-
dc.citation.issue9-
dc.citation.beginningpage3978-
dc.citation.endingpage3984-
dc.citation.publicationnameNANO LETTERS-
dc.identifier.doi10.1021/nl400209n-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorYoon, Jun-Bo-
dc.contributor.nonIdAuthorYeon, Jeongho-
dc.contributor.nonIdAuthorLee, Young Jae-
dc.contributor.nonIdAuthorYoo, Dong Eun-
dc.contributor.nonIdAuthorYoo, Kyoung Jong-
dc.contributor.nonIdAuthorKim, Jin Su-
dc.contributor.nonIdAuthorLee, Jun-
dc.contributor.nonIdAuthorLee, Jeong Oen-
dc.contributor.nonIdAuthorChoi, Seon-Jin-
dc.contributor.nonIdAuthorYoon, Gun-Wook-
dc.contributor.nonIdAuthorLee, Dong Wook-
dc.contributor.nonIdAuthorLee, Gi Seong-
dc.contributor.nonIdAuthorHwang, Hae Chul-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorNanomaterial-
dc.subject.keywordAuthornanowire-
dc.subject.keywordAuthornanopatterning-
dc.subject.keywordAuthorwire grid polarizer-
dc.subject.keywordAuthortop-down-
dc.subject.keywordAuthorspacer lithography-
dc.subject.keywordPlusWIRE GRID POLARIZER-
dc.subject.keywordPlusLARGE-AREA-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusLITHOGRAPHY-
dc.subject.keywordPlusSENSORS-
dc.subject.keywordPlusNANOTUBES-
dc.subject.keywordPlusDEVICES-
dc.subject.keywordPlusGROWTH-
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