기상유도결정화법 및 Hot-wire CVD 방법을 이용한 대결정립 다결정 Si 박막 성장에 관한 연구 = Growth of large-grained poly-Si film using vapor-induced crystallization and hot-wire CVD

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Advisors
안병태researcherAhn, Byung-Tae
Description
한국과학기술원 : 신소재공학과,
Publisher
한국과학기술원
Issue Date
2012
Identifier
511839/325007  / 020075244
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 신소재공학과, 2012.8, [ ix, 158 p. ]

Keywords

다결정실리콘; 기상유도결정화; 열선화학기상증착법; polycrystalline Si; vapor-induced crystallization; HWCVD; Si Epitaxy; 실리콘 에피택시

URI
http://hdl.handle.net/10203/181980
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=511839&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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