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Showing results 1 to 4 of 4

1
A chemical reaction path design for the atomic layer deposition of tantalum nitride thin films

Kwon, Jung-Dae; Park, Jin-Seong; Lee, Han-Choon; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.9, no.9, pp.G282 - G284, 2006-06

2
(A) study on the plasma-enhanced atomic layer deposition of TaN thin films = Peald 법으로 증착된 TaN 박막 특성에 관한 연구link

Chung, Hoi-Sung; 정회성; et al, 한국과학기술원, 2004

3
Comparison of Tantalum Nitride Films for Different NH3/H-2/Ar Reactant States in Two-Step Atomic Layer Deposition

Kwon, Jung-Dae; Yun, Jungheum; Kang, Sang-Won, JAPANESE JOURNAL OF APPLIED PHYSICS, v.48, no.2, 2009

4
Large-Area Uniform 1-nm-Level Amorphous Carbon Layers from 3D Conformal Polymer Brushes. A "Next-Generation" Cu Diffusion Barrier?

Kang, Yun-Ho; Lee, Sangbong; Choi, Youngwoo; Seong, Won Kyung; Han, Kyu Hyo; Kim, Jang Hwan; Kim, Hyun-Mi; et al, ADVANCED MATERIALS, v.34, no.15, 2022-04

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