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1
Chromium aluminum oxide films for ArF line high transmittance attenuated phase shifting mask application

Kim, E; Moon, SY; Kim, YH; Yoon, HS; No, Kwangsoo, OPTICAL ENGINEERING, v.39, no.11, pp.2947 - 2955, 2000-11

2
Simulation and fabrication of attenuated phase-shifting masks: CrFx

Kim, E; Hong, Daniel Seungbum; Kim, KS; Jiang, ZT; Kim, DW; Lim, S; Woo, SG; et al, APPLIED OPTICS, v.36, no.28, pp.7247 - 7256, 1997-10

3
Simulation of optical constants range of high-transmittance attenuated phase-shifting masks used in KrF laser and ArF laser

Kim, E; Moon, SY; Kim, YH; Yoon, HS; No, Kwangsoo, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.39, no.11, pp.6321 - 6328, 2000-11

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