Browse "Dept. of Materials Science and Engineering(신소재공학과)" by Subject atomic layer deposition

Showing results 1 to 28 of 28

1
A comparative study on the Si precursors for the atomic layer deposition of silicon nitride thin films

Lee, WJ; Lee, JH; Park, Chong-Ook; Lee, YS; Shin, SJ; Rha, SK, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.45, no.5, pp.1352 - 1355, 2004-11

2
A Study on the Growth Behavior and Stability of Molecular Layer Deposited Alucone Films Using Diethylene Glycol and Trimethyl Aluminum Precursors, and the Enhancement of Diffusion Barrier Properties by Atomic Layer Deposited Al2O3 Capping

Choi, Dong-won; Yoo, Mi; Lee, Hyuck-Mo; Park, Jozeph; Kim, Hyun You; Park, Jin-Seong, ACS APPLIED MATERIALS & INTERFACES, v.8, no.19, pp.12263 - 12271, 2016-05

3
(A) study on $SrTiO_3$ thin films deposited by plasma-enhanced atomic layer deposition for DRAM capacitor dielectric = PEALD법으로 증착된 DRAM capacitor 유전체용 $SrTiO_3$ 박막의 특성에 관한 연구link

Ahn, Ji-Hoon; 안지훈; et al, 한국과학기술원, 2009

4
(A) study on plasma-enhanced atomic layer deposition of Ta-Si-O thin films = 탄탈륨 실리콘 산화막의 플라즈마 원자층 증착법에 관한 연구link

Song, Hyun-Jung; 송현정; et al, 한국과학기술원, 2003

5
(A) study on the novel heating resistors based on the composite metal-oxides for inkjet printhead = 잉크젯 프린트 헤드를 위한 새로운 금속 산화물 기반의 발열체 특성에 관한 연구link

Kwon, Se-hun; 권세훈; et al, 한국과학기술원, 2008

6
ALD와 PEALD를 이용한 $Al_2O_3$ 박막 증착에 관한 연구 = A study on the $Al_2O_3$ thin film deposition by ALD and PEALDlink

전우석; Jeon, Woo-Seok; et al, 한국과학기술원, 2003

7
Arsenic decapping and half cycle reactions during atomic layer deposition of Al2O3 on In0.53Ga0.47As(001)

Shin, Byungha; Clemens, Jonathon B.; Kelly, Michael A.; Kummel, Andrew C.; McIntyre, Paul C., APPLIED PHYSICS LETTERS, v.96, no.25, 2010-06

8
Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

Ahn, Jinseong; Ahn, Changui; Jeon, Seokwoo; Park, Junyong, APPLIED SCIENCES-BASEL, v.9, no.10, pp.1 - 17, 2019-05

9
Beneficial effect of hydrogen in aluminum oxide deposited through the atomic layer deposition method on the electrical properties of an indium–gallium–zinc oxide thin-film transistor

Nam, Yunyong; Kim, Hee-Ok; Cho, Sung Haeng; Hwang, Chi-Sun; Kim, Taeho; Jeon, Sanghun; Park, Sang-Hee Ko, Journal of Information Display, v.17, no.2, pp.65 - 71, 2016-04

10
Effect of Double-Layered Al2O3 Gate Insulator on the Bias Stability of ZnO Thin Film Transistors

Yoon, Sung-Min; Park, Sang-Hee Ko; Yang, Shin-Hyuk; Byun, Chun-Won; Hwang, Chi-Sun, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.13, no.8, pp.264 - 267, 2010

11
Effect of Hydrogen on Hafnium Zirconium Oxide Fabricated by Atomic Layer Deposition Using H2O2 Oxidant

Kim, Hyoungkyu; Yun, Seokjung; Kim, Tae Ho; Kim, Hoon; Bae, Changdeuck; Jeon, Sanghun; Hong, Seungbum, PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, v.15, no.5, 2021-05

12
Electrical Characterization of Metal-Insulator-Semiconductor Capacitors Having Double-Layered Atomic-Layer-Deposited Al2O3 and ZnO for Transparent Thin Film Transistor Applications

Yoon, Sung-Min; Park, Sang-Hee Ko; Byun, Chun-Won; Yang, Shin-Hyuk; Hwang, Chi-Sun, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.157, no.7, pp.727 - 733, 2010

13
Enhanced Dielectric Properties of SrTiO3 Films with a SrRuO3 Seed by Plasma-Enhanced Atomic Layer Deposition

Ahn, Ji-Hoon; Kim, Ja-Yong; Kim, Jin-Hyock; Roh, Jae-Sung; Kang, Sang-Won, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.12, no.2, pp.G5 - G8, 2009

14
Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter

Yun, Seokjung; Kim, Sang-Joon; Youn, Jaesung; Kim, Hoon; Ryu, Jeongjae; Bae, Changdeuck; No, Kwangsoo; et al, NANOMATERIALS, v.10, no.3, pp.409, 2020-03

15
Gas-Permeable Inorganic Shell Improves the Coking Stability and Electrochemical Reactivity of Pt toward Methane Oxidation

Seo, Jongsu; Tsvetkov, Nikolai; Jeong, Seung Jin; Yoo, Yeongeun; Ji, Sanghoon; Kim, Jeong Hwan; Kang, Jeung Ku; et al, ACS APPLIED MATERIALS & INTERFACES, v.12, no.4, pp.4405 - 4413, 2020-01

16
Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition

Lee, YJ; Kang, Sang-Won, THIN SOLID FILMS, v.446, no.2, pp.227 - 231, 2004-01

17
Low-voltage dc thin-film electroluminescence with an indium-tin-oxide/CaS : Pb/ZnS/Al structure

Kim, YS; Park, SHK; Yun, SJ, JAPANESE JOURNAL OF APPLIED PHYSICS, v.42, no.5, pp.L520 - L522, 2003-05

18
Manganese Oxide Overlayers Promote CO Oxidation on Pt

Lee, Siwon; Lin, Chao; Kim, Seunghyun; Mao, Xinyu; Kim, Taeho; Kim, Sang-Joon; Gorte, Raymond J.; et al, ACS CATALYSIS, v.11, no.22, pp.13935 - 13946, 2021-11

19
Multifunctional Polymer Nanocomposites Reinforced by 3D Continuous Ceramic Nanofillers

Ahn, Changui; Kim, Sang-Min; Jung, Jae-Wook; Park, Junyong; Kim, Taegeon; Lee, Sang Eon; Jang, Dongchan; et al, ACS NANO, v.12, no.9, pp.9126 - 9133, 2018-09

20
Origin and passivation of fixed charge in atomic layer deposited aluminum oxide gate insulators on chemically treated InGaAs substrates

Shin, Byungha; Weber, Justin R.; Long, Rathnait D.; Hurley, Paul K.; Van de Walle, Chris G.; McIntyre, Paul C., APPLIED PHYSICS LETTERS, v.96, no.15, 2010-04

21
Oxidative Strong Metal-Support Interaction Induced by an Amorphous TiOx Seed Layer Boosts the Electrochemical Performance and High-Temperature Durability of Pt Nanocatalysts

Seo, Jongsu; Jeon, SungHyun; Lee, Siwon; Lim, Dae-Kwang; Kim, Jun Hyuk; Kim, Jeong Hwan; Ahn, Sejong; et al, ACS CATALYSIS, v.12, no.14, pp.8593 - 8600, 2022-07

22
Resistive switching mechanism of $TiO_2$ thin films grown by plasma-enhanced atomic layer deposition = PEALD 방법으로 성장된 $TiO_2$ 박막의 저항변화 메커니즘에 관한 연구link

Jeong, Hu-Young; 정후영; et al, 한국과학기술원, 2010

23
(The) microstructure and electrical property of $HfO_2/Al_2O_3$ films deposited by atomic layer deposition = 원자층 증착법으로 형성된 $HfO_2/Al_2O_3$ 박막의 결정 구조 변화 및 전기적 특성에 관한 연구link

Park, Pan-Kwi; 박판귀; et al, 한국과학기술원, 2007

24
Transmission electron microscopy study of $ZnO/Al_{2}O_{3}$ based thin film transistor grown by atomic layer deposition method = ALD 방법으로 증착된 $ZnO/Al_{2}O_{3}$ 기반 박막형 트랜지스터의 투과전자현미경 연구link

Jang, Yong-Woon; 장용운; et al, 한국과학기술원, 2011

25
Transparent Nanoscale Floating Gate Memory Using Self-Assembled Bismuth Nanocrystals in Bi2Mg2/3Nb4/3O7 (BMN) Pyrochlore Thin Films Grown at Room Temperature

Jung, Hyun-June; Yoon, Soon-Gil; Hong, Soon-Ku; Lee, Jeong-Yong, ADVANCED MATERIALS, v.24, no.25, pp.3396 - 3400, 2012-07

26
Unpinned Interface Between Al2O3 Gate Dielectric Layer Grown by Atomic Layer Deposition and Chemically Treated n-In0.53Ga0.47As(001)

Shin, Byungha; Cagnon, Joel; Long, Rathnait D.; Hurley, Paul K.; Stemmer, Susanne; McIntyre, Paul C., ELECTROCHEMICAL AND SOLID STATE LETTERS, v.12, no.8, pp.40 - 43, 2009

27
나노탬플릿과 원자층 증착법을 이용한 정렬된 TiN, $TiO_2$ 일차원 나노구조의 제조와 특성평가 = Fabrication and characterization of aligned TiN, $TiO_2$ one-dimensional nanostructures by nanotemplate and atomic layer depositionlink

김상준; Kim, Sang Joon; et al, 한국과학기술원, 2013

28
원자층증착법에 의한 $HfO_2$ 게이트절연막의 성장과 플라즈마처리에 의한 질화에 관한 연구 = Study on $HfO_2$ gate dielectric grown by atomic layer deposition and its nitridation by plasma treatmentlink

박건식; Park, Kun-Sik; et al, 한국과학기술원, 2011

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