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1
Atomic layer deposition of silicon oxide thin films by alternating exposures to Si(2)Cl(6) and O(3)

Lee, Seung-Won; Park, Kwangchol; Han, Byeol; Son, Sang-Ho; Rha, Sa-Kyun; Park, Chong-Ook; Lee, Won-Jun, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.7, pp.23 - 26, 2008

2
Investigation of silicon oxide thin films prepared by atomic layer deposition using SiH2Cl2 and O-3 as the precursors

Lee, JH; Kim, UJ; Han, CH; Rha, SK; Lee, WJ; Park, Chong-Ook, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, v.43, no.3A, pp.L328 - L330, 2004-03

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