A novel method for fabrication of polymer gate dielectric via solvent-free initiated chemical vapor deposition (iCVD)

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Publisher
한국화학공학회
Issue Date
2012-10-25
Language
KOR
Citation

한국화학공학회 2012년 추계학술대회

URI
http://hdl.handle.net/10203/175971
Appears in Collection
CBE-Conference Papers(학술회의논문)

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