Soft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force

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Herein we report on pattern formation of a self-assembled monolayer (SAM) using soft colloidal lithography, based on strong physical contact between microspheres and substrate. In typical colloidal lithography, weak contact of microspheres with the substrate does not block the formation of a SAM. To establish conformal contact between microspheres and substrate to block the formation of a SAM, magnetic force was exerted on softened paramagnetic microspheres that had been swollen by a solvent. The soft colloidal lithography with controlled buoyance enables pattern formation through simple wet chemistry. (C) 2013 Elsevier B.V. All rights reserved,
Publisher
ELSEVIER SCIENCE INC
Issue Date
2013-05
Language
English
Article Type
Article
Keywords

EDGE-SPREADING LITHOGRAPHY; SELF-ASSEMBLED MONOLAYERS; DIP-PEN NANOLITHOGRAPHY; GOLD; ARRAYS; SILVER; NANOPARTICLE; CRYSTALS

Citation

ELECTROCHEMISTRY COMMUNICATIONS, v.30, pp.99 - 102

ISSN
1388-2481
DOI
10.1016/j.elecom.2013.02.011
URI
http://hdl.handle.net/10203/173902
Appears in Collection
CH-Journal Papers(저널논문)
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