Self-Assembled Incorporation of Modulated Block Copolymer Nanostructures in Phase-Change Memory for Switching Power Reduction

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dc.contributor.authorPark, Woon-Ikko
dc.contributor.authorYou, Byoung-Kukko
dc.contributor.authorMun, Beom-Hoko
dc.contributor.authorSeo, Hyeon Kookko
dc.contributor.authorLee, Jeong-Yongko
dc.contributor.authorHosaka, Sumioko
dc.contributor.authorYin, Youko
dc.contributor.authorRoss, C. A.ko
dc.contributor.authorLee, Keon-Jaeko
dc.contributor.authorJung, Yeon-Sikko
dc.date.accessioned2013-06-07T07:59:58Z-
dc.date.available2013-06-07T07:59:58Z-
dc.date.created2013-05-07-
dc.date.created2013-05-07-
dc.date.created2013-05-07-
dc.date.issued2013-03-
dc.identifier.citationACS NANO, v.7, no.3, pp.2651 - 2658-
dc.identifier.issn1936-0851-
dc.identifier.urihttp://hdl.handle.net/10203/173809-
dc.description.abstractPhase change memory (PCM), which exploits the phase change behavior of chalcogenide materials, affords tremendous advantages over conventional solid-state memory due to its nonvolatility, high speed, and salability. However, high power consumption of PCM poses a critical challenge and has been the most significant obstacle to its widespread commercialization. Here, we present a novel approach based on the self-assembly of a block copolymer (BCP) to form a thin nanostructured SiOx layer that locally blocks the contact between a heater electrode and a phase change material. The writing current is decreased 5-fold (corresponding to a power reduction by 1/20) as the occupying area fraction of SiOx nanostructures is Increased from a fill factor of 9.1% to 63.6%. Simulation results theoretically explain the current reduction mechanism by localized switching of BCP-blocked phase change materials.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.titleSelf-Assembled Incorporation of Modulated Block Copolymer Nanostructures in Phase-Change Memory for Switching Power Reduction-
dc.typeArticle-
dc.identifier.wosid000316846700085-
dc.identifier.scopusid2-s2.0-84875650179-
dc.type.rimsART-
dc.citation.volume7-
dc.citation.issue3-
dc.citation.beginningpage2651-
dc.citation.endingpage2658-
dc.citation.publicationnameACS NANO-
dc.identifier.doi10.1021/nn4000176-
dc.contributor.localauthorLee, Jeong-Yong-
dc.contributor.localauthorLee, Keon-Jae-
dc.contributor.localauthorJung, Yeon-Sik-
dc.contributor.nonIdAuthorYou, Byoung-Kuk-
dc.contributor.nonIdAuthorMun, Beom-Ho-
dc.contributor.nonIdAuthorHosaka, Sumio-
dc.contributor.nonIdAuthorYin, You-
dc.contributor.nonIdAuthorRoss, C. A.-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorblock copolymers-
dc.subject.keywordAuthorself-assembly-
dc.subject.keywordAuthorphase change memory-
dc.subject.keywordPlusDIBLOCK COPOLYMER-
dc.subject.keywordPlusDATA-STORAGE-
dc.subject.keywordPlusSCALABLE NONVOLATILE-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusLITHOGRAPHY-
dc.subject.keywordPlusTEMPLATES-
dc.subject.keywordPlusPATTERNS-
dc.subject.keywordPlusORIENTATION-
dc.subject.keywordPlusTEMPERATURE-
dc.subject.keywordPlusELECTRODES-
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