A versatile patterning method for 3-dimensional complex pattern with 10nm scale over large area by secondary sputtering phenomenon

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The development of large-area nano-patterning with high resolution, high aspect ratio and simple process scheme/cost is a challenging work for realizing their potential applications in opto-electronics and nano-biotechnology such as nanoelectronics, optics, optical sensing, light-emitting devices and bio-sensing devices. Unlike previous nano-fabrication techniques reported thus far, our method has several powerful advantages such as high resolution(~10nm) and high aspect ratio(~15), easy fabrication process over large area, wide range of materials available, 3-dimensional complex nano-structure and easy controlling of pattern feature. Thus, our novel patterning technology will be able to introduce new concepts for fabricating high performance of future nanoscale devices.
Publisher
한국고분자학회
Issue Date
2011-04
Language
KOR
Citation

2011 춘계학술대회 , v.36, no.1

URI
http://hdl.handle.net/10203/171158
Appears in Collection
CBE-Conference Papers(학술회의논문)
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