High quality Si1-xGex nanowire and its application to MOSFET integrated with HfO2/TaN/Ta gate stack

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Issue Date
2007-09-18
Language
ENG
Citation

2007 International Conference on Solid State Devices and Materials(SSDM), pp.0 - 0

URI
http://hdl.handle.net/10203/158295
Appears in Collection
EE-Conference Papers(학술회의논문)
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