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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Two step annealing of iridium thin films prepared by plasma-enhanced atomic layer deposition

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dc.contributor.authorKim S.-W.-
dc.contributor.authorKwon S.-H.-
dc.contributor.authorKang S.-W.-
dc.date.accessioned2013-03-26T00:30:16Z-
dc.date.available2013-03-26T00:30:16Z-
dc.date.created2012-02-06-
dc.date.issued2008-10-13-
dc.identifier.citationAtomic Layer Deposition Applications 4 - 214th ECS Meeting, v., no., pp.309 - 314-
dc.identifier.issn1938-5862-
dc.identifier.urihttp://hdl.handle.net/10203/156404-
dc.languageENG-
dc.titleTwo step annealing of iridium thin films prepared by plasma-enhanced atomic layer deposition-
dc.typeConference-
dc.identifier.scopusid2-s2.0-63149198332-
dc.type.rimsCONF-
dc.citation.beginningpage309-
dc.citation.endingpage314-
dc.citation.publicationnameAtomic Layer Deposition Applications 4 - 214th ECS Meeting-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorKang S.-W.-
dc.contributor.nonIdAuthorKim S.-W.-
dc.contributor.nonIdAuthorKwon S.-H.-
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MS-Conference Papers(학술회의논문)
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