Two step annealing of iridium thin films prepared by plasma-enhanced atomic layer deposition

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 190
  • Download : 0
Issue Date
2008-10-13
Language
ENG
Citation

Atomic Layer Deposition Applications 4 - 214th ECS Meeting, pp.309 - 314

ISSN
1938-5862
URI
http://hdl.handle.net/10203/156404
Appears in Collection
MS-Conference Papers(학술회의논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0