Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition of TiO2 Films on Silica Gel Powders in a Circulating Fluidized Bed Reacrtor

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Issue Date
2006
Language
KOR
Citation

한국화학공학회학술회의, pp.P-FB-10 -

URI
http://hdl.handle.net/10203/150907
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CBE-Conference Papers(학술회의논문)
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