Material and electrical characterization of HfO2 films for MIM capacitors applications Material and electrical characterization of HfO2 films for MIM capacitors applications

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dc.contributor.authorCho, Byung Jin-
dc.contributor.authorHu, H-
dc.contributor.authorZhu, C-
dc.contributor.authorLu, YF-
dc.contributor.authorZeng, JN-
dc.contributor.authorWu, YH-
dc.contributor.authorLiew, YF-
dc.date.accessioned2013-03-18T09:06:42Z-
dc.date.available2013-03-18T09:06:42Z-
dc.date.created2012-02-06-
dc.date.issued2003-04-22-
dc.identifier.citationMRS Spring meeting, v., no., pp.0 - 0-
dc.identifier.urihttp://hdl.handle.net/10203/146826-
dc.languageENG-
dc.titleMaterial and electrical characterization of HfO2 films for MIM capacitors applications-
dc.title.alternativeMaterial and electrical characterization of HfO2 films for MIM capacitors applications-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage0-
dc.citation.endingpage0-
dc.citation.publicationnameMRS Spring meeting-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorCho, Byung Jin-
dc.contributor.nonIdAuthorHu, H-
dc.contributor.nonIdAuthorZhu, C-
dc.contributor.nonIdAuthorLu, YF-
dc.contributor.nonIdAuthorZeng, JN-
dc.contributor.nonIdAuthorWu, YH-
dc.contributor.nonIdAuthorLiew, YF-
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EE-Conference Papers(학술회의논문)
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