Material and electrical characterization of HfO2 films for MIM capacitors applicationsMaterial and electrical characterization of HfO2 films for MIM capacitors applications
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Cho, Byung Jin | - |
| dc.contributor.author | Hu, H | - |
| dc.contributor.author | Zhu, C | - |
| dc.contributor.author | Lu, YF | - |
| dc.contributor.author | Zeng, JN | - |
| dc.contributor.author | Wu, YH | - |
| dc.contributor.author | Liew, YF | - |
| dc.date.accessioned | 2013-03-18T09:06:42Z | - |
| dc.date.available | 2013-03-18T09:06:42Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2003-04-22 | - |
| dc.identifier.citation | MRS Spring meeting, v., no., pp.0 - 0 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/146826 | - |
| dc.language | ENG | - |
| dc.title | Material and electrical characterization of HfO2 films for MIM capacitors applications | - |
| dc.title.alternative | Material and electrical characterization of HfO2 films for MIM capacitors applications | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 0 | - |
| dc.citation.endingpage | 0 | - |
| dc.citation.publicationname | MRS Spring meeting | - |
| dc.identifier.conferencecountry | United States | - |
| dc.identifier.conferencecountry | United States | - |
| dc.contributor.localauthor | Cho, Byung Jin | - |
| dc.contributor.nonIdAuthor | Hu, H | - |
| dc.contributor.nonIdAuthor | Zhu, C | - |
| dc.contributor.nonIdAuthor | Lu, YF | - |
| dc.contributor.nonIdAuthor | Zeng, JN | - |
| dc.contributor.nonIdAuthor | Wu, YH | - |
| dc.contributor.nonIdAuthor | Liew, YF | - |
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