DSpace at KOASAS: High-performance ALD HfO2-Al2O3 laminate MIM capacitors for RF and mixed signal IC applications

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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

High-performance ALD HfO2-Al2O3 laminate MIM capacitors for RF and mixed signal IC applicationsHigh-performance ALD HfO2-Al2O3 laminate MIM capacitors for RF and mixed signal IC applications

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Cho, Byung Jin researcher / Hu, H / Ding, SJ / Lim, HF / Zhu, C / Li, MF / Kim, SJ

Issue Date: 2003-12-08

Language: ENG

Citation: International Electron Device Meeting (IEDM), pp.0 - 0

URI: http://hdl.handle.net/10203/146666

Appears in Collection: EE-Conference Papers(학술회의논문)

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High-performance ALD HfO2-Al2O3 laminate MIM capacitors for RF and mixed signal IC applicationsHigh-performance ALD HfO2-Al2O3 laminate MIM capacitors for RF and mixed signal IC applications

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