DSpace at KOASAS: Integration of high-K gate dielectric into high mobility substrate

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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

Integration of high-K gate dielectric into high mobility substrateIntegration of high-K gate dielectric into high mobility substrate

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Cho, Byung Jin researcher / Loh, WP / Zang, H / Dalapati, GK / Tong, Y / Choi, KJ

Issue Date: 2006-11-10

Language: ENG

Citation: 2006 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES SCIENCE AND TECHNOLOGY, pp.8 - 10

URI: http://hdl.handle.net/10203/143072

Appears in Collection: EE-Conference Papers(학술회의논문)

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