Highly Condensed Epoxy-Oligosiloxane-Based Hybrid Material for Transparent Low-k Dielectric Coatings

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A highly condensed epoxy-oligosiloxane resin was synthesized using a sol-gel condensation reaction of (3-glycidoxypropyl)trimethoxysilane and diphenylsilanediol in the presence of solvent. A higher degree of condensation and a larger molecular size of oligosiloxanes were achieved compared to a condensation reaction without the addition or a solvent. The epoxy-hybrimer coating film was Fabricated by the spin coating and thermal curing of the synthesized oligosiloxane resin. The leakage current density and the dielectric constant decreased From 25.9 to 7.6 nA cm(-2) and from 3.16 to 3.03, respectively, by using the solvent in the preparation. The hybrimer coating film of a highly condensed oligosiloxane resin had a high transmittance of over 90 % in a wavelength between 300 and 800 rim. Thus, the epoxy-hybrimer coating him can be utilized as the passivation layer in the thin-film transistor.
Publisher
AMER CHEMICAL SOC
Issue Date
2009-07
Language
English
Article Type
Article
Keywords

HYDROGEN SILSESQUIOXANE HSQ; PASSIVATION LAYER; SI-29 NMR; TFT-LCD; FILMS

Citation

ACS APPLIED MATERIALS & INTERFACES, v.1, no.7, pp.1585 - 1590

ISSN
1944-8244
DOI
10.1021/am900252v
URI
http://hdl.handle.net/10203/13602
Appears in Collection
MS-Journal Papers(저널논문)
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