Fabrication of c-axis oriented ZnO/AlN thin films prepared by radio frequency reactive sputtering and development of ZnO/AlN layered structure surface acoustic wave devices

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Issue Date
2001-04-22
Language
ENG
Citation

6th International Workshop on Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors, v.20, no.1, pp.42 - 46

ISSN
1071-1023
URI
http://hdl.handle.net/10203/135630
Appears in Collection
MS-Conference Papers(학술회의논문)
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