R.F. Magnetron Reactive Sputtering법으로 증착한 ITO박막의 밀도가 전기적성질에 미치는 영향Effect of Film Density on the Electrical Properties of ITO Thin Films Deposited by R.F. Magnetron Reactive Sputtering

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Issue Date
2000
Language
KOR
Citation

한국요업학회, pp.191 -

URI
http://hdl.handle.net/10203/134366
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MS-Conference Papers(학술회의논문)
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