2D nano/micro hybrid patterning using soft/block copolymer lithography

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In this work, we fabricated various 2D hybrid patterns with the feature resolution from micrometer to nanometer scale by using soft lithography and block copolymer lithography. Composite molds for the high-resolution with feature sizes from 135 nm to 50 mum were composed of a hard layer supported by soft PDMS layer. Polymer (PU) replica holes were made from the composite mold by replica molding. Block copolymers (PS-b-PMMA and PS-b-PI) were used as ink materials for the pattern smaller than 100 nm. UV and ozone etching was used for the selective removal of one block in the block copolymer. (C) 2003 Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
2004-01
Language
English
Article Type
Article; Proceedings Paper
Keywords

ARRAYS

Citation

MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, v.24, no.1-2, pp.213 - 216

ISSN
0928-4931
URI
http://hdl.handle.net/10203/12711
Appears in Collection
CBE-Journal Papers(저널논문)
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