2D nano/micro hybrid patterning using soft/block copolymer lithography
In this work, we fabricated various 2D hybrid patterns with the feature resolution from micrometer to nanometer scale by using soft lithography and block copolymer lithography. Composite molds for the high-resolution with feature sizes from 135 nm to 50 mum were composed of a hard layer supported by soft PDMS layer. Polymer (PU) replica holes were made from the composite mold by replica molding. Block copolymers (PS-b-PMMA and PS-b-PI) were used as ink materials for the pattern smaller than 100 nm. UV and ozone etching was used for the selective removal of one block in the block copolymer. (C) 2003 Elsevier B.V. All rights reserved.
- Publisher
- ELSEVIER SCIENCE BV
- Issue Date
- 2004-01
- Language
- English
- Article Type
- Article; Proceedings Paper
- Keywords
ARRAYS
- Citation
MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, v.24, no.1-2, pp.213 - 216
- ISSN
- 0928-4931
- Appears in Collection
- CBE-Journal Papers(저널논문)
- Files in This Item
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