Graded Etching of Thermal Oxide with Various Angles using Silicafilm

Publisher
IEEE-Inst Electrical Electronics Engineers Inc
Issue Date
1980-03
Language
ENG
Citation

IEEE ELECTRON DEVICE LETTERS, v.1, no.3, pp.30 - 31

ISSN
0741-3106
URI
http://hdl.handle.net/10203/1269
Appears in Collection
NE-Journal Papers(저널논문)
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