Colloidal lithographic nanopatterning via reactive ion etching

We report here a novel colloidal lithographic approach to the fabrication of nonspherical colloidal particle arrays with a long-range order by selective reactive ion etching (RIE) of multilayered spherical colloidal particles. First, layered colloidal crystals with different crystal structures (or orientations) were self-organized onto substrates. Then, during the RIE, the upper layer in the colloidal multilayer acted as a mask for the lower layer and the resulting anisotropic etching created nonspherical particle arrays and new patterns. The new patterns have shapes that are different from the original as a result of the relative shadowing of the RIE process by the top layer and the lower layers. The shape and size of the particles and patterns were dependent on the crystal orientation relative to the etchant flow, the number of colloidal layers, and the RIE conditions. The various colloidal patterns can be used as masks for two-dimensional (2-D) nanopatterns. In addition, the resulting nonspherical particles can be used as novel building blocks for colloidal photonic crystals.
Publisher
AMER CHEMICAL SOC
Issue Date
2004-06
Language
ENG
Keywords

3-DIMENSIONAL PHOTONIC CRYSTALS; PERIODIC NANOPILLAR ARRAYS; NANOSPHERE LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; SPHERICAL COLLOIDS; FABRICATION; SURFACES; PLASMA; SIZE; CRYSTALLIZATION

Citation

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, v.126, no.22, pp.7019 - 7025

ISSN
0002-7863
DOI
10.1021/ja0319083
URI
http://hdl.handle.net/10203/12616
Appears in Collection
CBE-Journal Papers(저널논문)
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