Cycle time improvement in manufacturing nitrided gate oxides for ULSI CMOS applications

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Publisher
IEEE
Issue Date
1996-04
Language
ENG
Citation

IEEE/SEMI Advanced Semiconductor Manufacturing Conference (Boston) Proceeding, pp.186 - 191

URI
http://hdl.handle.net/10203/123901
Appears in Collection
EE-Conference Papers(학술회의논문)
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