DSpace at KOASAS: Cycle time improvement in manufacturing nitrided gate oxides for ULSI CMOS applications

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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

Cycle time improvement in manufacturing nitrided gate oxides for ULSI CMOS applications

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Yoon, Giwan researcher

Publisher: IEEE

Issue Date: 1996-04

Language: ENG

Citation: IEEE/SEMI Advanced Semiconductor Manufacturing Conference (Boston) Proceeding, pp.186 - 191

URI: http://hdl.handle.net/10203/123901

Appears in Collection: EE-Conference Papers(학술회의논문)

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