DSpace at KOASAS: Process and characterization of (Pb, La)TiO3 thin film deposited by MOCVD for gigabit DRAM application

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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Conference Papers(학술회의논문)

Process and characterization of (Pb, La)TiO3 thin film deposited by MOCVD for gigabit DRAM application

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Kim, Ho Gi researcher

Issue Date: 1997

Language: ENG

Citation: European meeting on integrated ferroelectrics

URI: http://hdl.handle.net/10203/123758

Appears in Collection: MS-Conference Papers(학술회의논문)

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